Advanced thin film and nanomaterials analytical services
State-of-the-art materials analysis - a recipe for success
Built for our nanomaterials and thin film developments, our new Class 10K clean room deposition and analytical facility is now able to offer third parties fast turnaround measurement and verification services for their materials.
These services are offered on a commercial basis under a mutual NDA with no IP constraints on the third party. We aim for a single point, rapid turnabout measurement and deposition service for technology start-ups and R&D facilities wishing to access world class facility at short notice, and in a very cost effective way.
Our materials facility is equipped with state-of-the-art equipment for deposition and third party materials characterization:
- Bruker Dual Laser Confocal Raman microscope
- Bruker Optics FT-IR Spectrometer
- Woollam Spectroscopic Ellipsometery system
- Electrical characterization platform - DC to 1MHz
- Confocal and sequential sputtering in metallic and reactive modes (100mm)
- Argon/Oxygen dry etch (100mm Substrate)
Nanocluster/Nano particle deposition (100mm Substrate) - RTP/RTG/PTCVD Process reactors (100mm Substrate)
- Vacuum annealing - millitorr-500 torr in an inert or reactive environment
CVD/PECVD and ICP thin film deposition (100mm Substrate) - Phillips/FEI SEM’s with EDX (UoS)
- FEI –E-SEM (UoS)
- TGA/DSC (UoS)
- Nanoindentation
Please contact us directly for more information on our facilities and thin film deposition or characterisation capabilities.
Find out more
To find out more, contact us on +44 (0) 1273 515899, or see our contact page.